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초록
The effects of hydrogen clusters, relating to the hydrogen effusion peak around 350 degrees C, on the light-induced stability in hydrogenated amorphous silicon (a-Si:H) have been investigated. The hydrogen clusters were removed by increasing the temperature up to 400 degrees C with an increase rate of 12 degrees C/min. After removing the hydrogen clusters, a reduction in hydrogen content and weak Si-Si bond density was observed but the light-induced instability increased by a factor of 4 for the completely degraded state. The increase of the instability is consistent with a model of suppression of the long-range motion of atomic hydrogen by the hydrogen clusters. (C) 2000 Elsevier Science B.V. All rights reserved.
키워드
INDUCED DEFECT DENSITY; AMORPHOUS-SILICON; STABILITY; ORIGIN; PLASMA
- 제목
- Hindering the light-induced instability in a-Si:H by hydrogen clusters
- 저자
- Yoon, JH
- 발행일
- 2000-05
- 유형
- Article; Proceedings Paper
- 권
- 266
- 페이지
- 455 ~ 458