Alternative vapor-liquid-solid process in Au-assisted growth of silica nanowires

초록

We report the growth process of silica nanowires (NWs) grown by using a thick Au film as a catalyst, and suggest an alternative vapor-liquid-solid mechanism for NW growth. The silica NWs were grown by high-temperature annealing of silicon substrates coated with an Au film measuring either 20 nm or 60 nm thick in a N-2 atmosphere. A number of Au particles were observed inside the NWs, unlike NWs grown a single Au particle at their top. The results are attributed to the push-up growth of NWs by the continuous formation of silicon oxide on the top and/or side surfaces rather than underneath of the eutectic liquid Au-Si alloy suggested in the conventional vapor-liquid-solid process. (C) 2014 Elsevier B.V. All rights reserved.

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