Thin Film Coating of Particles Through the Plasma Process

  • Pham, Hung-Cuong
  • Kim, Kyo-Seon
Citations

WEB OF SCIENCE

3
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SCOPUS

4

초록

Polypropylene (PP) beads were coated with SiOx and TiO2 single-layer films and TiO2/SiOx 2double-layer films via rotating cylindrical plasma chemical vapor deposition (PCVD). The thicknesses of the SiOx and TiO2 single-layer films and TiO2/SiOx double-layer films could be easily controlled by changing the deposition time. The properties of the thin films were characterized via scanning electron microscopy and energy-dispersive X-ray spectroscopy. The double layers that were spread on PP beads were found to be TiO2/SiO1.72. It was found that the rotating cylindrical PCVD process can be used for coating particles with single- and double-layer films.

키워드

Particle CoatingTiO2/SiOxDouble-Layer FilmsRotating PCVD ReactorPhotocatalystsPlasma ProcessCYLINDRICAL PCVD REACTORGLASS-BEADSDEPOSITIONTITANIAWATER
제목
Thin Film Coating of Particles Through the Plasma Process
저자
Pham, Hung-CuongKim, Kyo-Seon
DOI
10.1166/jno.2011.1165
발행일
2011-08
유형
Article; Proceedings Paper
저널명
Journal of Nanoelectronics and Optoelectronics
6
3
페이지
264 ~ 267