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초록
Polypropylene (PP) beads were coated with SiOx and TiO2 single-layer films and TiO2/SiOx 2double-layer films via rotating cylindrical plasma chemical vapor deposition (PCVD). The thicknesses of the SiOx and TiO2 single-layer films and TiO2/SiOx double-layer films could be easily controlled by changing the deposition time. The properties of the thin films were characterized via scanning electron microscopy and energy-dispersive X-ray spectroscopy. The double layers that were spread on PP beads were found to be TiO2/SiO1.72. It was found that the rotating cylindrical PCVD process can be used for coating particles with single- and double-layer films.
키워드
Particle Coating; TiO2/SiOx; Double-Layer Films; Rotating PCVD Reactor; Photocatalysts; Plasma Process; CYLINDRICAL PCVD REACTOR; GLASS-BEADS; DEPOSITION; TITANIA; WATER
- 제목
- Thin Film Coating of Particles Through the Plasma Process
- 저자
- Pham, Hung-Cuong; Kim, Kyo-Seon
- 발행일
- 2011-08
- 유형
- Article; Proceedings Paper
- 권
- 6
- 호
- 3
- 페이지
- 264 ~ 267