Preparation and structural characteristics of ZrTiO4 thin films by plasma enhanced chemical vapor deposition

초록

The stoichiometric control and crystalline characteristics of ZrTiO <inf>4</inf> thin films prepared by plasma enhanced chemical vapor deposition, were studied. Post-deposition annealing of ZrTiO<inf>4</inf> thin films was performed using a horizontal furnace and appropriate conditions. The film composition was analyzed using an energy dispersive X-ray analyzer (EDX or wavelength dispersive X-ray analyzer (WDX). Results indicated that the crystalline behavior of ZrTiO<inf>4</inf> thin films strongly depended on the stoichiometric ratio of Zr/Ti in the film.