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Effects of process parameters on etching and surface activation of single walled, multiwalled, and thin-multiwalled carbon nanotube films by Radio Frequency Oxygen Plasma Processing

박찬원

제목: Effects of process parameters on etching and surface activation of single walled, multiwalled, and thin-multiwalled carbon nanotube films by Radio Frequency Oxygen Plasma Processing

저자: 박찬원

발행일: 2010-08-23

학회명: IVC-18

개최국가: 중국

학회 개최일: 2010-08-23 ~ 2010-08-27