상세 보기
Scaling down to sub-5 nm ferroelectric Hf0.5Zr0.5O2 thin films with anhydrous H2O2 ALD oxidant
- 김시준;
- Yong Chan Jung;
- Jin-Hyun Kim;
- Heber Hernandez-Arriga;
- Dan N. Le;
- 외 7명
- 제목
- Scaling down to sub-5 nm ferroelectric Hf0.5Zr0.5O2 thin films with anhydrous H2O2 ALD oxidant
- 저자
- 김시준; Yong Chan Jung; Jin-Hyun Kim; Heber Hernandez-Arriga; Dan N. Le; Su Min Hwang; Daniel Alvarez; Jeff Spiegelman; Takashi Onaya; Chang-Yong Nam; Yugang Zhang; Jiyoung Kim
- 발행일
- 2022-06-26
- 학회명
- International Conference on Atomic Layer Deposition (ALD) 2022
- 개최국가
- 벨기에
- 학회 개최일
- 2022-06-26 ~ 2022-06-29