Intrinsic deep-defect-related recombination process in hydrogenated amorphous silicon

  • Yoon, Jong-hwan
Citations

SCOPUS

1

초록

Intrinsic deep-defect-related recombination process has been investigated in a series of undoped hydrogenated amorphous silicon (a-Si:H) films grown under different deposition conditions. Steady-state photoconductivity (ph) was measured as a function of deep-defect density Nd, Urbach energy Eu, and dark Fermi energy EF. It was found that ph strongly depends on these parameters while EF stays at the energy levels lower than 0.82 eV below Ec, but it is nearly independent of those if EF stays above 0.82 eV. A possible distribution of deep-defect-related recombination centers and recombination process has been suggested. © 1994 The American Physical Society.

제목
Intrinsic deep-defect-related recombination process in hydrogenated amorphous silicon
저자
Yoon, Jong-hwan
DOI
10.1103/PhysRevB.49.8000
발행일
1994
유형
Article
저널명
Physical Review B - Condensed Matter and Materials Physics
49
12
페이지
8000 ~ 8004