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In-situ half-cycle study of high purity H2O2-based HfO2 atomic layer deposition for Hf based ferroelectric devices applications
- 김시준;
- Jinhyun Kim;
- Yong Chan Jung;
- Su Min Hwang;
- Dan N. Le;
- 외 5명
- 제목
- In-situ half-cycle study of high purity H2O2-based HfO2 atomic layer deposition for Hf based ferroelectric devices applications
- 저자
- 김시준; Jinhyun Kim; Yong Chan Jung; Su Min Hwang; Dan N. Le; Heber Hernandez-Arriga; K. Tan; Daniel Alvarez; Jeff Spiegelman; Jiyoung Kim
- 발행일
- 2022-06-26
- 학회명
- International Conference on Atomic Layer Deposition (ALD) 2022
- 개최국가
- 벨기에
- 학회 개최일
- 2022-06-26 ~ 2022-06-29