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Ultra shallow P+n junction formation using the boron diffusion from epitaxial CoSi₂ film

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Ultra shallow P+n junction formation using the boron diffusion from epitaxial CoSi₂ film
저자
이성만
발행일
1997-09-30
학회명
Advanced Metallization and Interconnect Systems for ULSI, MRS
학회 개최일
1997-09-30 ~ 1997-09-30

ScholarWorks@강원대학교

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