Application of TiO2 Photocatalysts to NO and SO2 Removal in the Dielectric Barrier Discharge Process

  • Nasonova, Anna
  • Kim, Dong-Joo
  • Kim, Kyo-Seon
  • Kim, Woosik
  • Charinpanitkul, Tawatchai
Citations

WEB OF SCIENCE

6
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6

초록

The dielectric barrier discharge Process combined with a TiO2 photocatalyst was applied to remove NO and SO2. The dielectric barrier discharge reactor was packed with glass beads as a dielectric material and the glass beads were coated with TiO2 particles by dip-coating into solutions of TiO2 particles prepared by using sol-gel method and of Degussa P-25 TiO2 particles. The TiO2 thin film dip-coated I time into the solution of TiO2 prepared by using the sot-gel method was the most uniform and efficient for NO and SO2 removal when using a dielectric barrier discharge photocatalyst hybrid system. The increase in the applied peak voltage enhanced the NO and SO2 removal efficiencies. The NO and SO2 removal efficiencies decreased as the initial NO and SO2 concentrations were increased.

키워드

Dielectric barrier discharge processTiO2 thin filmSol-gel methodNO and SO2 removalATOMIC LAYER DEPOSITIONTHIN-FILMSNONTHERMAL PLASMAHYBRID SYSTEMEXHAUST-GASDECOMPOSITIONREMEDIATIONBENZENEREACTOR
제목
Application of TiO2 Photocatalysts to NO and SO2 Removal in the Dielectric Barrier Discharge Process
저자
Nasonova, AnnaKim, Dong-JooKim, Kyo-SeonKim, WoosikCharinpanitkul, Tawatchai
DOI
10.3938/jkps.54.1042
발행일
2009-03
유형
Article; Proceedings Paper
저널명
Journal of the Korean Physical Society
54
3
페이지
1042 ~ 1047