Effects of ambient gas on cold atmospheric plasma discharge in the decomposition of trifluoromethane

초록

The effect of dilution gases (He, Ar and N-2) on plasma discharge in the decomposition of trifluoromethane (CHF3) was investigated in dielectric barrier discharge at atmospheric pressure. A comparison among these dilution gases was performed in terms of active power, apparent power, power factor, impedance, and power efficiency for the decomposition of CHF3. He dilution showed the most homogeneous and stable discharge among the dilution gases. However, Ar dilution ignited the generation of streamers in the plasma discharge, resulting in a relatively superior power efficiency in CHF3 decomposition. In addition, due to the plasma reactions between O-2 and N-2, N-2 as a dilution gas had a disadvantaging tendency to form nitric oxide compounds (harmful compounds). Complete decomposition of CHF3 could be performed under the following conditions; Ar dilution, active power >= 40 W, a CHF3 fraction of 0.2% and a total flow rate of 1000 ml min(-1).

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