Process conditions for complete decomposition of CHF3 in a dielectric barrier discharge reactor

초록

Plasma decomposition of CHF3 was investigated using a dielectric barrier discharge immersed in an electrically insulating oil bath in a mixture of CHF3, O-2, and N-2. CHF3 was well decomposed under a relatively high applied voltage in an atmospheric pressure plasma system. The main by-product was CO2 and its selectivity increased with a decrease in the CHF3 concentration in the feed. Complete decomposition of CHF3 was achieved at a typical process range: an applied voltage a parts per thousand yen7.0 kVp, an initial CHF3 flow rate of 3ml/min, and a total flow rate of 500ml/min. The value of energy efficiency and energy density at the center range for the complete decomposition of CHF3 was 0.01 mmol/kJ and 6.00kWh/Nm(3), respectively.

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