Ultra thin Al film on the W(110) surface

  • Choi, D. S.
  • Kim, D. H.
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초록

We have investigated the surface structure of the Al/W(110) surface using low energy electron diffraction (LEED) and low energy ion scattering spectroscopy (ISS). We observe a p(2 x 1) double domain LEED image for the 0.5 ML Al/W(110) surface at annealing temperature 850 degrees C. We found that 0.5 ML Al atoms cover on the W(110) surface uniformly but do not form 3 or 2-dimensional islands. We also measured the Al adsorption site at the Al/W(110)-p(2 x 1) surface using ISS. We found that Al atoms adsorbed at the center of the bridge site. The height of the adsorbed Al atoms is determined to be 2.18 +/- 0.15 angstrom above the W surface layer. (C) 2010 Elsevier B.V. All rights reserved.

키워드

Low energy ion scattering spectroscopyW(110)AluminumSurface structureAdsorption siteENERGY ION-SCATTERINGSI(001) SURFACEADSORPTIONGROWTHDIFFUSION
제목
Ultra thin Al film on the W(110) surface
저자
Choi, D. S.Kim, D. H.
DOI
10.1016/j.susc.2010.06.024
발행일
2010-09
유형
Article
저널명
Surface Science
604
19-20
페이지
1737 ~ 1741