Improvement of interface morphology between titanium-silicide and poly-Si thin film using Ar plasma treatment

초록

The effect of Ar plasma treatment on the interfaces between titanium silicide and poly-Si-thin films was reported. The surface roughness of the thin films was improved due to the surface etching effect of the particles. The interface between TiSi<inf>2</inf> and polysilicon thin film became smooth, when the sample with Ar plasma treatment was annealed.