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High density plasma treatment of polyimide substrate to improve structural and electrical properties of Ga-doped ZnO films
- Kwon, S. I.;
- Lee, S. J.;
- Jung, T. H.;
- Park, S. B.;
- Park, J. H.;
- ... Song, W. C.;
- 외 2명
WEB OF SCIENCE
9SCOPUS
10초록
We investigated the effects of a high density O-2 Plasma treatment on the structural and electrical properties of sputter-deposited GZO films. The GZO films were deposited on polyimide substrate without substrate heating by RF magnetron sputtering from a ZnO target mixed with 5 wt.% Ga2O3. Prior to the GZO film growth, we treated a polyimide substrate with highly dense inductively coupled oxygen plasma. The optical transmittance of the GZO film, about 80%. was maintained regardless of the plasma pre-treatment. However, the resistivity of the film was strongly influenced by the plasma pre-treatment. The resistivity of the GZO film decreased from 1.02 x 10(-2) Omega cm without an O-2 plasma pre-treatment to 1.89 x 10(-3) Omega cm with an O-2 plasma pre-treatment. (C) 2009 Elsevier B.V. All rights reserved.
키워드
- 제목
- High density plasma treatment of polyimide substrate to improve structural and electrical properties of Ga-doped ZnO films
- 저자
- Kwon, S. I.; Lee, S. J.; Jung, T. H.; Park, S. B.; Park, J. H.; Song, W. C.; Kang, I. N.; Lim, D. G.
- 발행일
- 2009-10-01
- 유형
- Article; Proceedings Paper
- 저널명
- Thin Solid Films
- 권
- 517
- 호
- 23
- 페이지
- 6298 ~ 6300