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Atomic layer deposition of niobium oxide using (tertbutylimido)tris(diethylamino)niobium and anhydrous hydrogen peroxide for ferroelectric hafnia applications
- 김시준;
- Jin-Hyun Kim;
- Jiyoung Kim;
- T. Ford;
- Minjong Lee;
- 외 5명
- 제목
- Atomic layer deposition of niobium oxide using (tertbutylimido)tris(diethylamino)niobium and anhydrous hydrogen peroxide for ferroelectric hafnia applications
- 저자
- 김시준; Jin-Hyun Kim; Jiyoung Kim; T. Ford; Minjong Lee; Dan Le; T. Chu; D. Kim; M. Benham; J. Spiegelman
- 발행일
- 2024-08-06
- 학회명
- International Conference on Atomic Layer Deposition (ALD) 2024
- 개최국가
- 핀란드
- 학회 개최일
- 2024-08-06 ~ 2024-08-06