Initial growth mode of ultra-thin Al films on a W(110) surface at high temperatures

초록

We investigated the adsorption structures and the initial growth mode of ultra-thin Al films on a W(110) surface at a high temperature. When Al atoms were adsorbed on the W(110) at the substrate temperature of 1100 K and with coverage of 0.5ML, Al atoms formed a p(2×1) double-domain structure. When the coverage was 1.0 ML, the double domain of a hexagonal structure (fcc(111) face) rotated ±5o from the [100] direction of the W(110) surface and another distorted hexagonal structure were found. Low-energy electron diffraction results along with ion scattering spectroscopy results showed that the Al atoms followed the Volmer-Weber growth mode at a high temperature.

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