분말소재의 표면처리를 위한 회전형 CVD 공정

Rotary CVD Process for Surface Treatment of Powders

초록

This paper reviews the potentials of a rotary chemical vapor deposition (RCVD) process for nanomaterial synthesis and coating on powder-based materials. The rotary reactor offers a significant improvement over traditional CVD methods having horizontal and fixed reaction chambers. The RCVD system yields enhanced productivity and surface coating uniformity of nanoparticles applied in various purposes, such as efficient heat dissipation, surface hardness enhancement, and enhanced energy storage performances. The effectiveness of the RCVD system would open up new possibilities in various applications because uniform coating on powder-based materials with massive productivity is inevitable to develop multi-functional materials with high reliability.

키워드

Thermal chemical vapor depositionRotary chemical vapor depositionPowder coatingMass production.
제목
분말소재의 표면처리를 위한 회전형 CVD 공정
제목 (타언어)
Rotary CVD Process for Surface Treatment of Powders
저자
이종환정구환
DOI
10.5695/JSSE.2023.56.6.341
발행일
2023-12
유형
Y
저널명
한국표면공학회지
56
6
페이지
341 ~ 352