Influence of annealing temperature and atmosphere on the properties of ITO films deposited using a powdery target

초록

Indium tin oxide (ITO) films have been prepared by r.f. magnetron sputtering. In order to improve the utilization efficiency of the target and reduce the cost of the film deposition processes, we used a powdery target instead of a conventional ceramic target. As-deposited films were annealed at temperatures between 100 degrees C and 500 degrees C for 30 min in various atmospheres, such as air, 02, H-2, N-2 and vacuum. The effects of the heat treatment conditions on the structural, the electrical, and theoptical properties of ITO films were investigated.

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