Tunneling Electroresistance Effect with Diode Characteristic for Cross-Point Memory

  • Lee, Hong-Sub
  • Park, Hyung-Ho
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초록

Cross-point memory architecture (CPMA) by using memristors has attracted considerable attention because of its high-density integration. However, a common and significant drawback of the CPMA is related to crosstalk issues between cells by sneak currents. This study demonstrated the sneak current free resistive switching characteristic of a ferroelectric tunnel diode (FTD) memristor for a CPMA by utilizing a novel concept of a ferroelectric quadrangle and triangle barrier switch. A FTD of Au/BaTiO3 (5 nm)/Nb-doped SrTiO3 (100) was used to obtain a desirable memristive effect for the CPMA. The FTD could reversibly change the shape of the ferroelectric potential from a quadrangle to a triangle. The effect included high nonlinearity and diode characteristics. It was derived from utilizing different sequences of carrier transport mechanisms such as the direct tunneling current, Fowler Nordheim tunneling, and thermionic emission. The FTD memristor demonstrated the feasibility of sneak current-free high-density CPMA.

키워드

ferroelectricstunneling electroresistance effectdiode memristorresistive RAMcross-point memoryBATIO3 THIN-FILMSPROSPECTSJUNCTIONSDEVICE
제목
Tunneling Electroresistance Effect with Diode Characteristic for Cross-Point Memory
저자
Lee, Hong-SubPark, Hyung-Ho
DOI
10.1021/acsami.6b03780
발행일
2016-06-22
유형
Article
저널명
ACS Applied Materials & Interfaces
8
24
페이지
15476 ~ 15481