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키워드
pulsed plasmas; particle coagulation; particle charge distribution; particle size distribution; plasma reactor; GROWTH; DEPOSITION; REACTOR; MODEL; COAGULATION; DISCHARGE; KINETICS; SILICON
- 제목
- Evolution of particle size distribution in a pulsed SiH4 plasma process
- 저자
- Kim, Dong-Joo; Kim, Kyo-Seon
- 발행일
- 2008-10
- 유형
- Article
- 저널명
- AIChE Journal
- 권
- 54
- 호
- 10
- 페이지
- 2768 ~ 2772