Plasma Reduction of Graphene Oxide in Atmospheric Pressure Glow Discharge

초록

The reduction of graphene oxide (GO) was processed in an atmospheric pressure plasma discharge with several gas mixtures consisting of the combination of H-2, Ar, N-2 and CH4. Oxygen-containing functional groups on the surface of the graphene oxide were effectively and rapidly removed in the ambient atmosphere of H-2 containing plasma discharge without artificial heating. An increase of the H-2 concentration in the feed gas mixture, applied AC voltage, and process time generally enhanced the reducing efficiency of the graphene oxide. The atomic carbon concentration of 68.81% was changed to 89.34% in the H-2/N-2 plasma after 30 min. The result shows that the plasma treatment is a practical and effective method for the reduction of graphene oxide.

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