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Low-temperature synthesis of thin graphite sheets using plasma-assisted thermal chemical vapor deposition system
- Lee, Byeong-Joo;
- Lee, Taeg-Woo;
- Park, Serin;
- Yu, Han-Young;
- Lee, Jeong-O;
- ... Lim, Sung-Hwan;
- ... Jeong, Goo-Hwan
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14초록
We report the low-temperature synthesis of thin graphite sheets using a hybrid chemical vapor deposition (HCVD) system that combines plasma and thermal CVD (TCVD). Electron beam deposited Ni films were used as catalytic substrates, and methane was used as a carbon feedstock. The quartz tube was into two regions: core plasma region for efficient dissociation of methane and a TCVD region for thermal synthesis, respectively. After the syntheses at different TCVD temperatures from 550 degrees C 10 900 degrees C, as-grown films were transferred to transparent polymeric substrates to apply as flexible conductive electrodes. Finally, it was found that thin graphite sheets consisting of similar to 15 graphene layers were synthesized at 600 degrees C using the HCVD system and could be applicable as transparent conductive films. (C) 2011 Elsevier B.V. All rights reserved.
키워드
- 제목
- Low-temperature synthesis of thin graphite sheets using plasma-assisted thermal chemical vapor deposition system
- 저자
- Lee, Byeong-Joo; Lee, Taeg-Woo; Park, Serin; Yu, Han-Young; Lee, Jeong-O; Lim, Sung-Hwan; Jeong, Goo-Hwan
- 발행일
- 2011-04-15
- 유형
- Article
- 권
- 65
- 호
- 7
- 페이지
- 1127 ~ 1130
- 언어
- ENG
- 출판사
- ELSEVIER SCIENCE BV
- 발행국가
- 네덜란드
- 분량
- 4 페이지
- ISSN
- E 1873-4979
P 0167-577X