Growth of Al on a W(110) surface

초록

Using low energy electron diffraction and low energy ion scattering spectroscopy, we investigated the growth mode of Al on a W(110) surface at room temperature and at 1000 K. We found that Al grew on the W(110) surface in the Frank-van der Merwe mode when the W substrate was kept at room temperature during Al deposition. It was found that at a coverage higher than 2 monolayer (ML) in Al grown at room temperature, Al atoms had a well-ordered face centered cubic (fcc) (111) surface. The [1 (1) over bar0] direction of the Al grown at room temperature on the (111) surface was parallel to the [001] direction of the W(110) substrate surface. When the temperature of the W substrate was kept at 1000 K, the adsorbed Al atoms grew in the Volmer-Weber mode. The 1.5 ML Al/W(110) surface prepared at 1000 K shows two domains of the fcc Al(111) surfaces along with a W(110) surface. We also found that the early stage of Al film growth shows W(110) structure. However as the film becomes thicker (above 3.5-4 layers) the Al face is turned into fcc (111) face. (C) 2012 Elsevier B. V. All rights reserved.

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