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PRTMOCVD 법을 통한 단성분계 산화막의 적층형 구조로부터 Zirconium Titanate 박막의 제조
- 이원규;
- 송병윤;
- 권영중
초록
novel fabrication method for the multi-component metal oxides such as zirconium titanate(ZrxTi1-xO2)low process temperature. The method has the basic concept that firstly layer-by-layer structure is constructed with theprimitive oxide layers, which are components of the desired multi-component oxides, and secondly the film is annealedat appropriate thermal conditions for the transformation to a single-phase multi-component oxides. In this study, PRT-MOCVD(pulsed rapid thermal metalorganic chemical vapor deposition) possessing the superior thicknes controllabilitywas introduced to prepare ZrO2 and TiO2 thin film for zirconium titanate. Single-phase zirconium titanate thin films havebeen prepared successfully by the interdiffusion of oxide multilayers having several alternating layers of ZrO2 and TiO2.The Zr/Ti ratio of zirconium titanate could be controlled easily by altering the thicknes of ZrO2 and TiO2 thin film.
키워드
- 제목
- PRTMOCVD 법을 통한 단성분계 산화막의 적층형 구조로부터 Zirconium Titanate 박막의 제조
- 제목 (타언어)
- Fabrication of Zirconium Titanate Thin film from Layer-by-Layer Structure of Primitive Oxides prepared by PRTMOCVD
- 저자
- 이원규; 송병윤; 권영중
- 발행일
- 2007-08
- 유형
- Y
- 권
- 45
- 호
- 4
- 페이지
- 378 ~ 383