PRTMOCVD 법을 통한 단성분계 산화막의 적층형 구조로부터 Zirconium Titanate 박막의 제조

Fabrication of Zirconium Titanate Thin film from Layer-by-Layer Structure of Primitive Oxides prepared by PRTMOCVD

초록

novel fabrication method for the multi-component metal oxides such as zirconium titanate(ZrxTi1-xO2)low process temperature. The method has the basic concept that firstly layer-by-layer structure is constructed with theprimitive oxide layers, which are components of the desired multi-component oxides, and secondly the film is annealedat appropriate thermal conditions for the transformation to a single-phase multi-component oxides. In this study, PRT-MOCVD(pulsed rapid thermal metalorganic chemical vapor deposition) possessing the superior thicknes controllabilitywas introduced to prepare ZrO2 and TiO2 thin film for zirconium titanate. Single-phase zirconium titanate thin films havebeen prepared successfully by the interdiffusion of oxide multilayers having several alternating layers of ZrO2 and TiO2.The Zr/Ti ratio of zirconium titanate could be controlled easily by altering the thicknes of ZrO2 and TiO2 thin film.

키워드

PRTMOCVDComposition ControlLayer-by-layerZirconium TitanateSolid State Thermal Difusion1. . .Zirconium titanate(ZrxTi1-xO2). microwave ... .. dielectricresonator. .. ...... ............ .PRTMOCVDComposition ControlLayer-by-layerZirconium TitanateSolid State Thermal Difusion1. . .Zirconium titanate(ZrxTi1-xO2). microwave ... .. dielectricresonator. .. ...... ............ .
제목
PRTMOCVD 법을 통한 단성분계 산화막의 적층형 구조로부터 Zirconium Titanate 박막의 제조
제목 (타언어)
Fabrication of Zirconium Titanate Thin film from Layer-by-Layer Structure of Primitive Oxides prepared by PRTMOCVD
저자
이원규송병윤권영중
발행일
2007-08
유형
Y
저널명
Korean Chemical Engineering Research(HWAHAK KONGHAK)
45
4
페이지
378 ~ 383