Effective of SiO2 Addition on the Self-cleaning and Photocatalytic Properties of TiO2 Films by Sol-gel Process

초록

Thin films of various composition in the system of TiO2 center dot SiO2 have been fabricated by the sol-gel process using Si(OC2H5) and Ti(OC3H7i)(4) as precursors. TiO2 center dot SiO2 films were formed on the glass substrate by spin-coating technique and heated at 500 degrees C for I h. The relationship between hydrophilicity, photocatalytic properties and self-cleaning property with SiO2 addition and UV light irradiation were investigated. Photocatalytic activity of TiO2 center dot SiO2 films showed decomposition of similar to 97% of acetaldehyde in 2 h and a water contact angle of similar to 10 degrees. TiO2 center dot SiO2 films can have more hydrophilic activity and less photocatalytic activity by increasing Of SiO2 addition. XPS measurements revealed that the amount of organic compounds adsorbed on the films decreased with the UV light irradiation and SiO2 addition, because of the increased of both OH group contents in films and decomposed organic contaminants of the films surface.

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