Enhancement of electron emission from silicon tips by nitrogen doped amorphous carbon coating

초록

Silicon field emitters have been coated with nitrogenated amorphous carbon (alpha-C:N) in order to enhance the electron emission current. The coating was produced using a helical resonator plasma enhanced chemical vapor deposition system. The alpha-C:N film is amorphous and hydrogenated with about 30 at % hydrogen. Nitrogen is also included in the amorphous network and reduces the work function by doping. alpha-C:N coating enhances significantly the emission current of silicon tips. (C) 1999 American Vacuum Society. [S0734-211X(99)05702-9].

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