Formation of ZnO Nanosheets by Oxidizing Zn Film

초록

In this work, we report a simple method for fabricating nanostructured ZnO by directly exposing thin Zn film to an atomic oxygen plasma produced by plasma-enhanced chemical vapor deposition (PECVD). Thin Zn films (similar to 500-nm thickness) were exposed to an atomic oxygen plasma at 380 degrees C for 30 min, and well-defined ZnO nanosheets of about 5 inn thickness are shown to be produced, forming a nanoflower-like structure as analyzed by using field-emission electron microscopy (FESEM). The nanosheets were characterized by using transmission electron microscopy (TEM), energy dispersive X-ray spectroscopy (EDS), X-ray diffraction spectroscopy (XRD), and photoluminescence (PL) measurements. The resulting nanosheets exhibited wurtzite hexagonal structures grown along the [10-10] direction and emitted both ultraviolet and green light centered near 380 nm and 540 nm, respectively. A possible explanation is discussed.

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