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자료 필터
자료유형
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2013 ~ 2026
2013 2026
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전체 158건 중 111번부터 120번까지의 결과를 표시합니다.
2020
Article
High growth rate and high wet etch resistance silicon nitride grown by low temperature plasma enhanced atomic layer deposition with a novel silylamine precursor
- Kim, Harrison Sejoon ;
- Hwang, Su Min ;
- Meng, Xin ;
- Byun, Young-Chul ;
- Jung, Yong Chan ;
- ... Kim, Si Joon ;
- 외 7명
- 2020-10-07
- Journal of Materials Chemistry C
- ROYAL SOC CHEMISTRY
Conference
Investigation of hydrogen effect on ferroelectricity of atomic layer deposited Hf0.5Zr0.5O2 thin film
- 2020-10-04
- 미국
Article
Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source
- Jung, Yong Chan ;
- Hwang, Su Min ;
- Le, Dan N. ;
- Kondusamy, Aswin L. N. ;
- Mohan, Jaidah ;
- ... Kim, Si Joon ;
- 외 10명
- 2020-08
- Materials
- MDPI
Article
A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf0.5Zr0.5O2Thin Films
- Kim, Si Joon ;
- Mohan, Jaidah ;
- Kim, Harrison Sejoon ;
- Hwang, Su Min ;
- Kim, Namhun ;
- 외 9명
- 2020-07
- Materials
- MDPI
Conference
The effect of oxygen source on ferroelectricity of atomic layer deposited Hf0.5Zr0.5O2 thin film
- 2020-06-29
- 벨기에
Conference
High wet etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition using 1？1？1-tris(dimethylamino)disilane
- 2020-06-29
- 벨기에
Conference
A combinatorial approach to the ferroelectric properties in HfxZr1-xO2 deposited by atomic layer deposition
- 2020-06-29
- 벨기에
Article
Ozone based high-temperature atomic layer deposition of SiO2 thin films
- Hwang, Su Min ;
- Qin, Zhiyang ;
- Kim, Harrison Sejoon ;
- Ravichandran, Arul ;
- Jung, Yong Chan ;
- ... Kim, Si Joon ;
- 외 3명
- 2020-06-01
- Japanese Journal of Applied Physics
- IOP PUBLISHING LTD