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자료 필터
자료유형
발행연도
2013 ~ 2026
2013 2026
키워드
언어
전체 158건 중 101번부터 110번까지의 결과를 표시합니다.
2021
Conference
Oxygen source effect on ferroelectric properties of atomic layer deposited Hf0.5Zr0.5O2 film
- 김시준 ;
- 박혜련 ;
- 김효정 ;
- 유정규
- 2021-06-30
- 대한민국
Conference
Electrode effect on ferroelectric properties of atomic layer deposited Hf0.5Zr0.5O2 films
- 김시준 ;
- 박혜련 ;
- 김효정 ;
- 유정규
- 2021-06-30
- 대한민국
Article
Extremely Low Leakage Threshold Switch with Enhanced Characteristics via Ag Doping on Polycrystalline ZnO Fabricated by Facile Electrochemical Deposition for an X-Point Selector
- Kim, Harrison Sejoon ;
- Sahota, Akshay ;
- Mohan, Jaidah ;
- Lucero, Antonio T. ;
- Jung, Yong Chan ;
- ... Kim, Si Joon ;
- 외 4명
- 2021-05-25
- ACS APPLIED ELECTRONIC MATERIALS
- AMER CHEMICAL SOC
Article
A Novel Combinatorial Approach to the Ferroelectric Properties in HfxZr1-xO2 Deposited by Atomic Layer Deposition
- Jung, Yong Chan ;
- Mohan, Jaidah ;
- Hwang, Su Min ;
- Kim, Jin-Hyun ;
- Le, Dan N. ;
- ... Kim, Si Joon ;
- 외 7명
- 2021-05
- physica status solidi (RRL) - Rapid Research Letters
- WILEY-V C H VERLAG GMBH
Article
Low-Thermal-Budget Fluorite-Structure Ferroelectrics for Future Electronic Device Applications
- Kim, Hyo Jeong ;
- An, Yonghwan ;
- Jung, Yong Chan ;
- Mohan, Jaidah ;
- Yoo, Jeong Gyu ;
- ... Kim, Si Joon ;
- 외 4명
- 2021-05
- physica status solidi (RRL) - Rapid Research Letters
- WILEY-V C H VERLAG GMBH
Article
Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiNx Films Using Trichlorodisilane for Etch-Resistant Coatings
- Hwang, Su Min ;
- Kim, Harrison Sejoon ;
- Le, Dan N. ;
- Ravichandran, Arul Vigneswar ;
- Sahota, Akshay ;
- ... Kim, Si Joon ;
- 외 7명
- 2021-03-26
- ACS APPLIED NANO MATERIALS
- AMER CHEMICAL SOC
Article
Ferroelectric polarization retention with scaling of Hf0.5Zr0.5O2 on silicon
- Mohan, Jaidah ;
- Hernandez-Arriaga, Heber ;
- Jung, Yong Chan ;
- Onaya, Takashi ;
- Nam, Chang-Yong ;
- ... Kim, Si Joon ;
- 외 2명
- 2021-03-08
- Applied Physics Letters
- AMER INST PHYSICS
Conference
The effect of TiN top and bottom electrodes on the ferroelectric properties of Hf0.5Zr0.5O2 thin films
- 김시준 ;
- 유정규 ;
- 김영인 ;
- 안용환 ;
- 김효정 ;
- 외 3명
- 2021-01-25
- 대한민국