상세 보기
자료 필터
자료유형
발행연도
2013 ~ 2026
2013 2026
키워드
언어
전체 158건 중 81번부터 90번까지의 결과를 표시합니다.
2022
Conference
In-situ half-cycle study of high purity H2O2-based HfO2 atomic layer deposition for Hf based ferroelectric devices applications
- 김시준 ;
- Jinhyun Kim ;
- Yong Chan Jung ;
- Su Min Hwang ;
- Dan N. Le ;
- 외 5명
- 2022-06-26
- 벨기에
Conference
Furnace annealing effect on ferroelectric Hf0.5Zr0.5O2 thin films
- 김시준 ;
- 조민관 ;
- 강종묵 ;
- 공태호 ;
- 김지희 ;
- 외 4명
- 2022-06-22
- 대한민국
Conference
A study on ferroelectric properties of Hf0.5Zr0.5O2-based MFIS capacitors
- 김시준 ;
- 조민관 ;
- 강종묵 ;
- 공태호 ;
- 김지희 ;
- 외 4명
- 2022-06-22
- 대한민국
Conference
Effect of ramp rate during furnace annealing on ferroelectric Hf0.5Zr0.5O2 thin films
- 김시준 ;
- 조민관 ;
- 강종묵 ;
- 공태호 ;
- 김지희 ;
- 외 4명
- 2022-06-22
- 대한민국
Conference
W electrode effect on ferroelectric properties of ALD-Hf0.5Zr0.5O2 films
- 김시준 ;
- 유정규 ;
- 박혜련 ;
- Yong Chan Jung ;
- Jiyoung Kim
- 2022-06-22
- 대한민국
Conference
A study on ferroelectric properties of ALD-(Hf,Zr)O2 thin films using a combinatorial approach
- 김시준 ;
- 유정규 ;
- 박혜련 ;
- Yong Chan Jung ;
- Jiyoung Kim
- 2022-06-22
- 대한민국
Article
Relaxation Induced by Imprint Phenomena in Low-Temperature (400 °C) Processed Hf0.5Zr0.5O2-Based Metal-Ferroelectric-Metal Capacitors
- Mohan, Jaidah ;
- Jung, Yong Chan ;
- Hernandez-Arriaga, Heber ;
- Kim, Jin-Hyun ;
- Onaya, Takashi ;
- ... Kim, Si Joon ;
- 외 4명
- 2022-04-26
- ACS APPLIED ELECTRONIC MATERIALS
- AMER CHEMICAL SOC
Article
High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
- Hwang, Su Min ;
- Kim, Harrison Sejoon ;
- Le, Dan N. ;
- Sahota, Akshay ;
- Lee, Jaebeom ;
- ... Kim, Si Joon ;
- 외 7명
- 2022-03
- Journal of Vacuum Science and Technology A
- A V S AMER INST PHYSICS
Conference
The scaling of low-temperature ferroelectric Hf0.5Zr0.5O2 thin films using anhydrous H2O2
- 김시준 ;
- Yong Chan Jung ;
- Jin-Hyun Kim ;
- Jaidah Mohan ;
- Heber Hernandez-Arriaga ;
- 외 4명
- 2022-02-27
- 미국