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자료 필터
자료유형
발행연도
2013 ~ 2026
2013 2026
키워드
언어
전체 158건 중 71번부터 80번까지의 결과를 표시합니다.
2023
Conference
A study of ferroelectric properties according to ramp rate during Hf0.5Zr0.5O2 crystallization
- 김시준 ;
- 강종묵 ;
- 유정규 ;
- 박혜련 ;
- 박성빈 ;
- 외 2명
- 2023-02-13
- 대한민국
Conference
Analysis of ferroelectric properties of ALD-Hf0.5Zr0.5O2 thin films according to oxygen source
- 김시준 ;
- 이승빈 ;
- 유정규 ;
- 박혜련 ;
- 박성빈 ;
- 외 2명
- 2023-02-13
- 대한민국
Article
강유전체 Hf0.5Zr0.5O2 박막의 퍼니스 어닐링 효과 연구
- 조민관 ;
- 유정규 ;
- 박혜련 ;
- 강종묵 ;
- 공태호 ;
- ... 김시준 ;
- 외 2명
- 2023-01
- 전기전자재료학회논문지
- 한국전기전자재료학회
Article
A Study on the Thermal Budget of Ferroelectric TiN/Hf0.5Zr0.5O2/TiN Capacitors for Next-Generation Memory Applications
- Park, Hye Ryeon ;
- Yoo, Jeong Gyu ;
- Kang, Jong Mook ;
- Cho, Min Kwan ;
- Gong, Taeho ;
- ... Kim, Si Joon ;
- 외 8명
- 2023
- 2023 7TH IEEE ELECTRON DEVICES TECHNOLOGY & MANUFACTURING CONFERENCE, EDTM
- IEEE
Article
Strategy for Low Temperature HZO Ferroelectric Capacitors for Back-End of Line Applications
- Kim, Jin-Hyun ;
- Lee, Minjong ;
- Lee, Seojun ;
- Jung, Yong Chan ;
- Choi, Rino ;
- ... Kim, Si Joon ;
- 외 2명
- 2023
- 2023 7TH IEEE ELECTRON DEVICES TECHNOLOGY & MANUFACTURING CONFERENCE, EDTM
- IEEE
2022
Conference
Half-cycle study with in-situ infrared spectroscopy of anhydrous hydrogen peroxide, ozone, and water based HfO2 atomic layer deposition for ferroelectric hafnia based device applications
- 김시준 ;
- Jin-Hyun Kim ;
- Yong Chan Jung ;
- Su Min Hwang ;
- Dan N. Le ;
- 외 5명
- 2022-12-07
- 미국
Article
Robust low-temperature (350?) ferroelectric Hf0.5Zr0.5O2 fabricated using anhydrous H2O2 as the ALD oxidant
- Jung, Yong Chan ;
- Kim, Jin-Hyun ;
- Hernandez-Arriaga, Heber ;
- Mohan, Jaidah ;
- Hwang, Su Min ;
- ... Kim, Si Joon ;
- 외 9명
- 2022-11-28
- Applied Physics Letters
- AIP Publishing
Conference
A study on ferroelectric properties of furnace-annealed Hf0.5Zr0.5O2 films
- 김시준 ;
- 조민관 ;
- 강종묵 ;
- 공태호 ;
- 유정규 ;
- 외 5명
- 2022-11-06
- 대한민국
Conference
Scaling down to sub-5 nm ferroelectric Hf0.5Zr0.5O2 thin films with anhydrous H2O2 ALD oxidant
- 김시준 ;
- Yong Chan Jung ;
- Jin-Hyun Kim ;
- Heber Hernandez-Arriga ;
- Dan N. Le ;
- 외 7명
- 2022-06-26
- 벨기에